By utilizing physical analysis and nano-material analysis methods, JFE-TEC analyzes the microstructure of objects and substances from a macro to atomic scale on the basis of material, product, and part.
We introduce optimum methods of analysis according to the material and provide optimum analysis techniques.
Devices and methods used for physical analysis are rapidly advancing. We also introduce physical analyses on the basis of the method of analysis.
To give direction to research and development, solve malfunctions and failures, and manage processes, it is necessary to consider the conditions of use and examine phenomena after correctly understanding the physical properties of the materials used.
JFE-TEC offers solutions to issues after understanding the physical properties of materials and examining the phenomena.
We examine phenomena by considering the process, use condition, etc.
Based on examination result, we can make following proposals:
The structure to exhibit the necessary physical property differs from material to material. We provide optimum analysis techniques according to the structure.
JFE-TEC observes and analyzes the sections, interface structures, and morphologies of products and composite materials that employ thin films and fine particles of metal, ceramics, and high polymers at nano-scale resolutions. We will also undertake precise sample preparation for observation of section/interface structure and morphology.
The size of controlled structure and analysis method vary from material to material.
We offer optimum analysis techniques for optimum morphological observation, element analysis, surface chemical state analysis, and crystalline structure analysis.
The practical sample thickness and detectable concentration range in various analysis methods are restricted. The table below shows some examples.
As the structure to analyze differs from subject to subject, the analysis method differs as well.
Various bulk materials, thin film/surface treatment, and fine particle morphology (shape, size/thickness, particle size distribution, aggregability) are observed.
Elements composing various bulk materials, thin film/surface treatment, fine particles are analyzed (qualitative/quantitative analysis, in-plane distribution/depth direction distribution/ three-dimensional distribution, chemical bonding state).
Various bulk materials, thin film/surface treatment, and the crystalline structure of fine particle (substance identification, determination of crystalline structure, crystalline orientation/aggregate structure, and residual stress) are observed, and then evaluated and analyzed.
Samples suitable for analyses in atomic scale to macro scale such as section polishing, FIB processing, argon ion beam processing, and microtoming of various materials (steel/non-ferrous metal, ceramics, semiconductor, polymer, thin film/surface treatment, etc.) are prepared.
In the case with cryo microtome/FIB suitable for polymer materials susceptible to damage, material for lithium-ion secondary battery and neodymium magnet, we also undertake preparation in environment unexposed to atmosphere, which is a prerequisite.
Abbreviation | |
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Transmission Electron Microscopy with Cs corrector | Cs corrector TEM |
Transmission Electron Microscopy | TEM |
Ultra Low Voltage Scanning Electron Microscopy | ULV-SEM |
Scanning Electron Microscopy | SEM |
Three Dimensional Scanning Electron Microscopy | 3D-SEM |
Focused Ion beam - Scanning Electron Microscopy | FIB-SEM |
Abbreviation | |
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X-ray Photoelectron Spectroscopy | XPS |
Auger Electron Spectroscopy | AES |
Secondary Ion Mass Spectrometry | SIMS |
Time Of Flight-Secondary Ion Mass Spectrometry | TOF-SIMS |
Electron Probe Micro-Analysis | EPMA |
Field Emission-Electron Probe Micro-Analysis | FE-EPMA |
Electron Energy Loss Spectroscopy | EELS |
Thermal Desorption Spectroscopy | TDS |
Raman Scattering Spectroscopy | RSS |
Fourier Transform Infrared Absorption | FT-IR |
Laser Ablation Inductively Coupled Plasma Mass Spectrometry | LA-ICP-MS |
Abbreviation | |
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X-ray Diffraction (capable of Rietveld analysis) | XRD |
Electron Diffraction | ED |
Electron Backscatter Diffraction Electron Backscatting Pattern |
EBSD/EBSP |
Abbreviation | |
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Inductively Coupled Plasma Atomic Emission Spectrometry | ICP-AES |
Inductively Coupled Plasma Mass Spectrometry | ICP-MS |
UV-VIS (Ultraviolet Visible Absorption Spectroscopy) - Spectrophotometer in near-infrared to near-ultraviolet region | UV-VIS |
Atomic Absorption Spectrometry | AAS |
Gas Chromatograph Mass Spectrometry | GC-MS |
Liquid Chromatograph Mass Spectrometry | LC-MS |
Abbreviation | |
---|---|
Laser diffraction particle size distribution measurement | |
Thermal Analysis | TA |
Thermogravimetric Analysis | TG |
Differential Thermal Analysis | DTA |
Differential Scanning Calorimetry | DSC |
Specific surface area measurement, pore size distribution (BET method) |
Abbreviation | |
---|---|
Nano particle concentration measurement by TEM |
Paper/ symposium | Place of publication | Year of publication | Title |
---|---|---|---|
Paper | Journal of the Surface Finishing Society of Japan | 2013 | The Effect of Steel Sheet Pretreatment on Alloying Behavior of Galvanized Steel Sheet |
Paper | Bulletin of Gunma Industrial Technology Center | 2013 | Forefront of Material Nano Structure Observation Using Electron Microscopy |
International symposium | 6th International Symposium on Practical Surface Analysis |
2013 | "Damage of ZrO2 by Argon Ion Bombardment" |
Domestic symposium | Polymer Material Meeting of The Japan Society for Analytical Chemistry | 2008 | New Analysis Method of Material Electrode Surface by Ultra Low Voltage SEM |
Domestic symposium | 29th meeting held by Surface Analysis Society of Japan in 2009 | 2009 | Ultra Low Voltage SEM as New Form of Surface Observation |
Domestic symposium | 1st Forum of Society for Study of Foreign Substances in 2009 | 2009 | Physical Analysis Technique for Foreign Substance Analysis and Malfunction Investigation |
Domestic symposium | Meeting of the Surface Science Society of Japan in 2009 | 2009 | Progress of Material Observation by Ultra Low Acceleration Voltage SEM |
Domestic symposium | Meeting held by Nanotech Department of The Surface Finishing Society of Japan | 2010 | Analysis Techniques in Nano Material Development |
Domestic symposium | Meeting of the Surface Science Society of Japan in 2011 | 2011 | Roles of Surface Analysis in Progress of Steel Material |
Domestic symposium | Meeting of the Japan Society for Heat Treatment in 2011 | 2011 | Forefront of Analysis of Metallic Material Microstructure by ULV-SEM |
Domestic symposium | Meeting of the Japan Society for Applied Physics in 2012 | 2012 | Damage of Zr Oxide by Ar Ion Irradiation |
Domestic symposium | Meeting of the Surface Science Society of Japan in 2012 32nd Surface Science Academic Meeting |
2012 | Damage of ZrO2 by Ar Ion Irradiation |
Domestic symposium | Corporate exhibitions in 20th meeting held by Advanced Power Semiconductors Workshop, The Japan Society for Applied Physics | 2012 | Electron Microscopy Technologies Used According to Structure Size from Atomic Scale to Macro Scale |
Domestic symposium | 37th conference of the Gunma Industrial Technology Center | 2013 | Forefront of Material Nano Structure Observation Using Electron Microscopy |
Domestic symposium | Meeting of the Japanese Society of Microscopy in 2013 | 2013 | Examples of Utilization of Ultra Low-voltage Scanning Electron Microscopy for Surface/Interface Analysis |
Domestic symposium | 22nd meeting of the Advanced Power Semiconductors Workshop, The Japan Society for Applied Physics | 2013 | Analysis of C State in Gate Oxide/SiC Interface Using Cs Corrector STEM |
Domestic symposium | 22nd meeting of the Advanced Power Semiconductors Workshop, The Japan Society for Applied Physics | 2013 | Electron Microscopy Technologies Used According to Structure Size from Atomic Scale to Macro Scale |
Domestic symposium | 30th panel discussion on rare earth by the Rare Earth Society of Japan | 2013 | Analysis Technique of Atomic Scale Structure of Intercrystalline Phase in Meodymium Magnet Using Cs Corrector STEM |
Domestic symposium | 2nd meeting held by Advanced Power Semiconductors Division, the Japan Society for Applied Physics | 2014 | Techniques of Interface Observation Using Electron Microscopy According to Structure Size from Atomic Scale to Macro Scale |